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Question

In a MOSFET the drain saturation current is

This question was previously asked in
UGC NET 2016 Paper 1 Question Paper (10-Jul-2016)
The correct answer is

\(\dfrac{\mu_n C_{ox} W}{2L}(V_{gs}-V_{th})^{2}\)

The question is asking about the expression for drain saturation current in a MOSFET. Let's analyze the given options and find out the correct formula.

The drain saturation current for a MOSFET in the saturation region is given by the well-known formula:

\(I_{D(sat)} = \dfrac{\mu_n C_{ox} W}{2L}(V_{gs}-V_{th})^{2}\)

where:

  • \(\mu_n\) is the electron mobility.
  • \(C_{ox}\) is the oxide capacitance per unit area.
  • \(W\) is the width of the MOSFET channel.
  • \(L\) is the length of the MOSFET channel.
  • \(V_{gs}\) is the gate-source voltage.
  • \(V_{th}\) is the threshold voltage.

This formula is valid for the saturation region, where the transistor operates with maximum current flow for a given gate-source voltage.

The options provided are:

  1. \(\dfrac{\mu_n C_{ox} W}{L}(V_{gs}-V_{th})\)
  2. \(\dfrac{\mu_n C_{ox} W}{2L}(V_{gs}-V_{th})^{2}\)
  3. \(\dfrac{\mu_n C_{ox} W}{2L}(V_{gs}-V_{th})v_{ds}\)
  4. \(\dfrac{\mu_n C_{ox} L}{W}(V_{gs}-V_{th})^{2}\)

Upon comparing these options with the known formula for drain saturation current, we see that the correct option is:

Option 2: \(\dfrac{\mu_n C_{ox} W}{2L}(V_{gs}-V_{th})^{2}\)

This matches the standard expression for the drain saturation current in a MOSFET operating in the saturation region.

Therefore, the correct answer is:

\(\dfrac{\mu_n C_{ox} W}{2L}(V_{gs}-V_{th})^{2}\)

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Similar Questions

  1. The threshold voltage of an n-channel MOSFET can be increased by

  2. Assertion (A) : MOS ICs based on MOSFET structure find wide applications in digital field.

    Reason (R) : MOS ICs have small size and are easy to fabricate.

  3. In MOSFET, the linear region current is :

    (A) \(\dfrac{\mu_{n}C_{ox}w}{L}\left(V_{gs}-V_{th}-\dfrac{V_{ds}}{2}\right)V_{ds}\)
    (B) \(\dfrac{\mu_{n}C_{ox}w}{L}\left(V_{gs}-V_{th}\right)V_{ds}\)
    (C) \(\dfrac{\mu_{n}C_{ox}w}{2L}\left(V_{gs}-V_{th}\right)V_{ds}^{2}\)
    (D) \(\dfrac{\mu_{n}C_{ox}w}{L}\left(V_{gs}-V_{th}\right)^{2}\)

    Choose the most appropriate answer from the options given below :

  4. Approximate oxide capacitance value (Cgd) for saturation operating mode of MOS transistor is:

  5. For an n-channel MOS transistor with $\mu_n$ = 600 cm2/Vs, Cox = 7 x 10-8  F/cm2, W = 40 $\mu_m$, L = 4$\mu_m$ and VTO=1.0 V, the value of K parameter is:

  6. In MOS

    A. The substrate fermi potential ϕF is negative in NMOS

    B. The substrate fermi potential ϕF is positive in NMOS

    C. The substrate bias voltage VSB is positive in NMOS, negative in PMOS

    D. The substrate bias voltage VSB is negative in NMOS, positive in PMOS.

    Choose the correct answer from the options given below:

  7. In enhancement mode MOSFET the saturation (drain) current is given by

    (a) \(K\dfrac{W}{L}(V_{gs}-V_{th})^{2}\)

    (b) \(K\dfrac{W}{L}(V_{gs}-V_{th})(1+\lambda V_{ds})\)

    (c) \(K\dfrac{W}{L}(V_{gs}-V_{th})^{2}(1+\lambda V_{ds})\)

    (d) \(K\dfrac{W}{L}(V_{gs}-V_{th})^{2}(1-\lambda V_{ds})\)

    Out of these

  8. For the n-channel MOSFET shown in the figure given below, threshold voltage Vth = 2 V. The drain current ID of the MOSFET is 4 mA when the drain resistance RD is 1 kΩ. If the value of RD is increased to 4 kΩ, then the drain current ID will become :

  9. The threshold voltage of a MOSFET can be lowered by

    1. using a thinner gate oxide
    2. reducing the carrier concentration in the substrate
    3. increasing the carrier concentration in the substrate

    Of these statements :

  10. The threshold voltage of an n-channel MOSFET can be increased by


Important Questions from MOSFET

  1. An n-channel MOSFET is connected as shown in the Figure.
    Assume $V_{TH} = 1\text{ V}$, $V_{DD} = 5\text{ V}$, and $\mu C_{ox}\left(\frac{W}{L}\right) = 2\text{ mA V}^{-2}$ and neglect channel length modulation effects.
    The gate voltage ($V_G$) of the n-channel MOSFET (in Volt) is __.
    (rounded off to two decimal places)

  2. A semiconductor uses P-type substrates with $N_A = 5 \times 10^{15}cm^{-3}$ in an n-MOS device having depletion region width of 0.415 $\mu$m. What is the depletion charge in magnitude?
  3. MOSFETs exhibit a non-linear relationship between input voltage and output current due to the device construction. The non-linear relationship is connected through the device parameter 'K'. Calculate 'K' for a specific MOSFET operating with an input voltage of 6 V and output current of 10 mA. The Threshold voltage of the chosen MOSFET is 4 V.
  4. Given below are two statements: one is labelled as Assertion (a) and the other is labelled as Reason (r).
    Assertion (a): In a ratioless logic, the transistors can be of minimum size.
    Reason (r): In a ratioless logic, the logic levels are not dependent upon the relative device size.
  5. What are the effects of increasing temperature in the I-V characteristics of the NMOS transistor ?
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