Consider an abrupt p-n junction under thermal equilibrium. If the acceptor doping concentration (NA) in the p-region is made significantly larger than the donor doping concentration (ND) in the n-region (i.e., $N_A ≫ N_D$), how is the depletion region physically distributed?
It extends primarily into the lightly doped n-type region.
This question examines how the depletion region of an abrupt p-n junction distributes itself when the two sides are doped unequally. At thermal equilibrium, diffusion of carriers across the metallurgical junction leaves behind fixed, ionized dopant atoms: negative acceptor ions on the p-side and positive donor ions on the n-side. This exposed charge forms the depletion (space-charge) region and sets up the built-in potential.
The controlling principle is overall charge neutrality of the depletion region — the total exposed negative charge on the p-side must equal the total exposed positive charge on the n-side:
NA × xp = ND × xn
where xp and xn are the depletion widths penetrating the p-side and n-side respectively. Rearranging:
xn / xp = NA / ND
When NA ≫ ND (heavily doped p-side, lightly doped n-side), the ratio NA/ND is large, so xn ≫ xp. In words: the side with fewer dopant atoms per unit volume must extend much farther to expose an equal amount of total charge. Therefore the depletion region extends primarily into the lightly doped n-type region — the correct answer. (This is exactly the principle behind a one-sided or p⁺-n junction.)
Why the other options are wrong:
At room temperature, the region in a PN junction diode where there are no mobile electrons or holes is called __________________.
Under forward-bias conditions, what is the primary mechanism that creates forward current across a PN junction?
Before breakdown, increasing reverse voltage causes reverse saturation current to __________.
The existence of cut-in voltage in a diode is mainly due to the presence of __________.
What is the main disadvantage of a half-wave rectifier?
In a p-n junction diode
1. In reverse bias mode the bulk resistance is dominant.
2. The junction impedance is variable.
In a MOS transistor, if n+ region is diffused in p-type substrate, the type of pn junction generated towards channel and drain is:
Match the following lists :
| List – I | List – II | ||||||
|---|---|---|---|---|---|---|---|
| a. | Abrupt p-n junction | i. |
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| b. | Linearly graded p-n junction | ii. |
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| c. | Tunnel diode | iii. |
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| d. | p-i-n diode | iv. |
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Correct codes are :
Consider the following statements for a p-n junction diode :
(a) It is an active component
(b) Depletion layer width decreases with forward biasing
(c) In the reverse bias case, saturation current increases with increasing temperature
Which of the statements given above are correct ?
At room temperature, the region in a PN junction diode where there are no mobile electrons or holes is called __________________.