Wet oxidation is given by :
Si + 2H2O
Thermal oxidation of silicon grows SiO2 at about 900–1200 °C and is of two kinds.
Dry oxidation uses pure oxygen: Si + O2 → SiO2. It is slow but gives dense, high-quality gate oxide.
Wet oxidation uses water vapour (steam): Si + 2H2O → SiO2 + 2H2. It is much faster because H2O diffuses through the oxide more readily, so it is used for thick field oxides.
Si + HF relates to etching (HF removes oxide), not oxidation, and Si + H2 produces no oxide.
Hence, wet oxidation is given by Si + 2H2O.
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Codes:
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