n-channel MOSFET is preferred than p-channel MOSFET because :
the electron mobility in Si is larger than the mobility of holes
Drain current: \(I_D = \frac{1}{2}\mu C_{ox}\frac{W}{L}(V_{GS} - V_T)^2\), so \(I_D \propto \mu\).
In Si at 300 K: \(\mu_n \approx 1350\ \mathrm{cm^2/V\,s}\), \(\mu_p \approx 480\ \mathrm{cm^2/V\,s}\), so \(\mu_n \approx 2.8\,\mu_p\).
Higher mobility gives more current, higher transconductance and faster switching for the same device size.
Input impedance of both types is extremely high (insulated gate), so it is not the deciding factor.
Hence, the electron mobility in Si is larger than the mobility of holes.
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