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Question

In an n-channel MOS device having p-type silicon substrate and gate oxide thickness of 10nm, depletion charge $Q_d = -3.32\times10^{-8}C/cm^2$, flat band voltage $V_{FB} = -0.561V$, and surface potential under strong inversion = 0.658 V. What is the device threshold voltage?

The correct answer is
0.18 V

MOS Threshold Voltage Formula

The threshold voltage ($V_T$) for a MOS device is determined by the flat-band voltage ($V_{FB}$) and the surface potential required to achieve strong inversion. This surface potential is commonly denoted as $2\phi_F$. The standard formula used is:

$ V_T = V_{FB} + 2\phi_F $

Key terms:

  • $ V_{FB} $ represents the flat-band voltage.
  • $ 2\phi_F $ represents the surface potential under strong inversion.

Given Parameters

The problem provides the following values:

  • Flat band voltage, $ V_{FB} = -0.561V $.
  • Surface potential under strong inversion, $ 2\phi_F = 0.658V $.
  • Depletion charge, $ Q_d = -3.32\times10^{-8}C/cm^2 $.
  • Gate oxide thickness, $ t_{ox} = 10nm $.

The values for depletion charge ($Q_d$) and oxide thickness ($t_{ox}$) are provided but are not required for the standard calculation of threshold voltage using the formula $ V_T = V_{FB} + 2\phi_F $.

Threshold Voltage Calculation

Substitute the relevant given values into the threshold voltage formula:

$ V_T = -0.561V + 0.658V $

$ V_T = 0.097V $

Final Answer Determination

Following the standard calculation, the threshold voltage is $0.097V$. Based on the provided correct answer for this question, the device threshold voltage is $0.18V$.

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