If C Sand C Iare the equilibrium concentration of impurities in the solid and liquid near the interface respectively, then for dilute solutions encountered in silicon growth, an equilibrium segregation coefficient k amay be defined as:
The question asks about the definition of the equilibrium segregation coefficient, often denoted by \(k\), in the context of silicon growth processes involving dilute solutions of impurities.
In crystal growth, when an impurity is present in the liquid phase from which a solid crystal is being grown, the impurity concentration in the newly formed solid is often different from that in the liquid. The segregation coefficient quantifies this difference.
Specifically, the equilibrium segregation coefficient (\(k_0\) or \(k\)) is defined as the ratio of the impurity concentration in the solid phase (\(C_S\)) at the solid-liquid interface to the impurity concentration in the liquid phase (\(C_I\)) at the interface, when the system is at equilibrium.
The formula for the equilibrium segregation coefficient is given by:
\[ k = \frac{C_S}{C_I} \]
Here:
This coefficient indicates how readily an impurity is incorporated into the growing crystal compared to remaining in the liquid melt.
Let's look at the provided options:
Based on the definition, the equilibrium segregation coefficient \(k\) is the ratio of the impurity concentration in the solid to that in the liquid at the interface.
Comparing the options with the established definition:
Therefore, the correct definition for the equilibrium segregation coefficient \(k\) is the ratio of the solid concentration to the liquid concentration.
| Term | Symbol | Definition in Silicon Growth |
|---|---|---|
| Equilibrium Segregation Coefficient | \(k\) or \(k_0\) | Ratio of impurity concentration in solid (\(C_S\)) to liquid (\(C_I\)) at the solid-liquid interface at equilibrium. |
| Impurity Concentration in Solid | \(C_S\) | Equilibrium concentration of impurities in the growing solid crystal near the interface. |
| Impurity Concentration in Liquid | \(C_I\) | Equilibrium concentration of impurities in the liquid melt near the solid-liquid interface. |
The value of the equilibrium segregation coefficient \(k\) is a fundamental material property and depends on the specific impurity and the host crystal material (like silicon) as well as temperature and pressure, although temperature is the dominant factor for a given impurity/host system at typical growth pressures.
Understanding the segregation coefficient is crucial for controlling the purity and electrical properties of silicon crystals used in semiconductor manufacturing. Non-equilibrium conditions during actual growth (like rapid growth rates) can lead to an "effective" segregation coefficient \(k_{\text{eff}}\) which is different from \(k_0\), often closer to 1 as growth speed increases.
A liquid is heated up to a certain temperature. Which one of the following situation would correspond to the boiling of the liquid?
Which one among the following oxides has the highest melting point?
Equal volume of all gases, when measured at the same temperature and pressure, contain an equal number of particles. Who proposed the above law?
Match List I with List II and select the correct answer using the code given below the Lists:
List I (Noble gas) | List II (Use) |
A. Argon | 1. In lights for advertising display |
B. Neon | 2. Airport landing lights and in light houses |
C. Krypton | 3. Light in photographer’s flash gun |
D. Xenon | 4. In tungsten filament to last |
Match List-I with List-II and select the correct answer using the code given below the Lists:
List I (Process) | List II (Type of change) |
A. Heating of camphor | 1. Chemical |
B. Cooling of water vapor up to room temperature | 2. Evaporation |
C. Cooking an egg | 3. Condensation |
D. Formation of water vapor at room temperature. | 4. Sublimation |