When Ge is doped with _______ a p-type semiconductor is formed.
boron
When a pure semiconductor material like Germanium (Ge) is intentionally mixed with a small amount of an impurity element, this process is known as doping. Doping is crucial for altering the electrical conductivity of semiconductors, making them suitable for various electronic applications. Depending on the type of impurity added, either an n-type or a p-type semiconductor can be formed.
A p-type semiconductor is formed when a tetravalent semiconductor element, such as Germanium (Ge) or Silicon (Si) (both belonging to Group 14 of the periodic table), is doped with a trivalent impurity. Trivalent impurities are elements that have three valence electrons and belong to Group 13 of the periodic table.
Let's consider the other options provided and their effect on Germanium doping:
| Impurity Type | Group (Valence Electrons) | Resulting Semiconductor Type | Majority Charge Carriers | Example Impurities for Ge/Si |
|---|---|---|---|---|
| Acceptor Impurity | Group 13 (Trivalent, 3) | P-type | Holes | Boron (B), Aluminum (Al), Gallium (Ga), Indium (In) |
| Donor Impurity | Group 15 (Pentavalent, 5) | N-type | Electrons | Phosphorous (P), Arsenic (As), Antimony (Sb) |
In summary, to form a p-type semiconductor from Germanium (Ge), it must be doped with a trivalent impurity from Group 13. Among the given options, boron is the correct choice as it is a Group 13 element.
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