The metal gate that is insulated from the channel is also referred to as:
IGFET
The question asks for the alternative name for a metal gate that is insulated from the channel in a transistor. Let's break down the concept and the options provided.
A Metal-Oxide-Semiconductor Field-Effect Transistor (MOSFET) is a fundamental component in modern electronics, used extensively in digital circuits and amplifiers. Its operation relies on an electric field, controlled by a voltage applied to the gate terminal, to modulate the conductivity of a channel between the source and drain terminals.
A key characteristic of MOSFETs is that the gate terminal is electrically isolated from the semiconductor channel. This isolation is typically achieved using a thin layer of dielectric material, most commonly silicon dioxide ($SiO_2$). This insulating layer prevents current flow directly between the gate and the channel, allowing the gate voltage to control the channel's conductivity purely through electrostatic effects.
The term IGFET stands for Insulated-Gate Field-Effect Transistor. This name directly highlights the defining feature mentioned in the question: the presence of an insulating layer separating the gate electrode from the conducting channel.
Since the defining structure of a MOSFET involves an insulated gate, the term IGFET is often used synonymously with MOSFET. It accurately describes the device where the gate is insulated from the channel. Therefore, a metal gate that is insulated from the channel is also referred to as an IGFET.
In summary, the term that specifically describes a field-effect transistor with an insulated gate, like the one mentioned in the question, is IGFET.
A JFET is also called ________ device.
In JFET, the Pinch‐off Voltage can be defined as:
In JFET, the current density in the x-direction is:
A. σ(x)E x
B. qN DμE x
C. \(\rm \frac{q}{2 \in_s}N_D\mu\)
D. \(\rm \frac{N_D\mu}{2 \in_s}\)
Choose the correct answer from the options given below:
The pull up to pull down ratio for an n mos inverter driven by another n mos inverter can be evaluated from:
(A) Vi nv = V t − \(\rm\frac{V_{t d}}{\sqrt{Zpu/Zpd}}\)
(B) V inv = \(\rm\frac{−V_{t d}}{\sqrt{Zpu/Zpd}}\)
(C) \(\rm\frac{W_{pd}}{L_{pd}}\) (V inv − V t) 2= \(\rm\frac{W_{p u}}{L_{p u}}\) (−V td )2
(D) \(\rm\frac{W_{p d}}{L_{p d}}\) (V inv − V t ) = \(\rm\frac{W_{p u}}{L_{pu}}\) (−V td )2
Choose the correct answer from the options given below:
The layers of Nos involves a subset of layers. For NMOS we require:
(A) Contact, (Black or Brown)
(B) Polysilicon (Green)
(C) Metal (Blue)
(D) Implant (Yellow)
Choose the correct answer from the options given below: